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An investigation of signal performance enhancements achieved through innovative pixel design across several generations of indirect detection, active matrix, flat-panel arrays

机译:通过创新的像素设计,对几代间接检测,有源矩阵,平板阵列的信号性能增强进行了研究

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摘要

Active matrix flat-panel imager (AMFPI) technology is being employed for an increasing variety of imaging applications. An important element in the adoption of this technology has been significant ongoing improvements in optical signal collection achieved through innovations in indirect detection array pixel design. Such improvements have a particularly beneficial effect on performance in applications involving low exposures and∕or high spatial frequencies, where detective quantum efficiency is strongly reduced due to the relatively high level of additive electronic noise compared to signal levels of AMFPI devices. In this article, an examination of various signal properties, as determined through measurements and calculations related to novel array designs, is reported in the context of the evolution of AMFPI pixel design. For these studies, dark, optical, and radiation signal measurements were performed on prototype imagers incorporating a variety of increasingly sophisticated array designs, with pixel pitches ranging from 75 to 127 μm. For each design, detailed measurements of fundamental pixel-level properties conducted under radiographic and fluoroscopic operating conditions are reported and the results are compared. A series of 127 μm pitch arrays employing discrete photodiodes culminated in a novel design providing an optical fill factor of ∼80% (thereby assuring improved x-ray sensitivity), and demonstrating low dark current, very low charge trapping and charge release, and a large range of linear signal response. In two of the designs having 75 and 90 μm pitches, a novel continuous photodiode structure was found to provide fill factors that approach the theoretical maximum of 100%. Both sets of novel designs achieved large fill factors by employing architectures in which some, or all of the photodiode structure was elevated above the plane of the pixel addressing transistor. Generally, enhancement of the fill factor in either discrete or continuous photodiode arrays was observed to result in no degradation in MTF due to charge sharing between pixels. While the continuous designs exhibited relatively high levels of charge trapping and release, as well as shorter ranges of linearity, it is possible that these behaviors can be addressed through further refinements to pixel design. Both the continuous and the most recent discrete photodiode designs accommodate more sophisticated pixel circuitry than is present on conventional AMFPIs – such as a pixel clamp circuit, which is demonstrated to limit signal saturation under conditions corresponding to high exposures. It is anticipated that photodiode structures such as the ones reported in this study will enable the development of even more complex pixel circuitry, such as pixel-level amplifiers, that will lead to further significant improvements in imager performance.
机译:有源矩阵平板成像器(AMFPI)技术正用于越来越多的成像应用中。采用该技术的一个重要因素是通过间接检测阵列像素设计的创新实现了对光信号采集的重大持续改进。此类改进对涉及低曝光和/或高空间频率的应用中的性能具有特别有益的影响,在该应用中,与AMFPI器件的信号电平相比,由于相对较高的附加电子噪声,检测量子效率大大降低。在本文中,在AMFPI像素设计的发展过程中,报告了对各种信号特性的检查,该检查是通过与新型阵列设计相关的测量和计算确定的。对于这些研究,在原型成像器上进行了暗,光和辐射信号测量,这些成像器采用了各种日益复杂的阵列设计,像素间距范围为75至127μm。对于每种设计,都报告了在射线照相和荧光透视操作条件下进行的基本像素级属性的详细测量,并比较了结果。采用分立光电二极管的一系列127μm间距阵列以一种新颖的设计达到了极点,该新颖的设计提供了约80%的光学填充率(从而确保了提高的X射线灵敏度),并展示了低暗电流,非常低的电荷俘获和电荷释放,以及线性信号响应范围大。在两个间距分别为75和90μm的设计中,发现一种新颖的连续光电二极管结构可提供接近100%理论最大值的填充因子。两组新颖的设计都通过采用其中一些或全部光电二极管结构被提升到像素寻址晶体管的平面上方的体系结构来实现大的填充因子。通常,观察到离散或连续光电二极管阵列中填充因子的增强不会由于像素之间的电荷共享而导致MTF的下降。尽管连续设计表现出相对较高的电荷捕获和释放水平,并且线性范围更短,但可以通过进一步完善像素设计来解决这些问题。连续光电二极管设计和最新的离散光电二极管设计都可以容纳比传统AMFPI上更复杂的像素电路,例如像素钳位电路,这种电路已被证明可以在高曝光条件下限制信号饱和。可以预料的是,如本研究中报道的那样,光电二极管结构将能够开发甚至更复杂的像素电路,例如像素级放大器,这将导致成像器性能的进一步显着改善。

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